Solaris 200

Rapid Thermal Processor

 

The Solaris 200 is a manual loading RTP system built typically for the R&D and pre-production environment. The Solaris 200 can process up to 200mm substrates at a temperature range from RT- 1300 degrees. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emmissivity differences.

The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system can accommodate 6 interlocked MFCs for gas mixing and forming gas processing. The Solaris is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

This System has state of the art options available and is customizable by the end user on purchase. We work with the buyer on every additional feature needed to have a final product that will meet the laboratory demands of the modern scientist. If you are interested in these customizable options please contact a sales representative in your area.

Overview

▪ Excellent repeatability by use of state of the art thermocouple signal conditioning.

▪User Friendly software that allows users to interact with data including 9 different graphing options.

▪ Operating Temperature Range RT – 1300 Degrees Celsius

▪Gas Delivery system is capable of up to 6 Mass Flow controllers.

▪ Zone control temperature for enhanced process control and allows for top side or bottom side heating only as an option.

▪ Wafer Capability: 1″ to 8″ , Sample holders are available.

▪ Sic Coated Susceptors available for III-V processing.

▪ Quartz Liners Available for BPSG/PSG Processing

 

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