SOLARIS 150mm UV
RAPID THERMAL PROCESS OVEN (RTP)
Overview
The Solaris 150UV is a standalone unit or an added option for the
Solaris 150 RTP System.
Applications Include:
-Pre Gate Oxidation Cleaning
-Pre-Epi Cleaning
-Photoresist Descum
-Growth of Sacrificial Oxides
-Bond Pad Cleaning
-Cleaning of Critical Surfaces
-Hydrocarbon Removal
-High Temperature UV/Ozone Densification
Main Features
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Wafer handling: Manual loading of wafer into the oven, single wafer processing
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Wafer sizes: 2", 3", 4", 5", 6"
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Ramp up rate: 1-150°C per second, user-controllable.
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Recommended steady state duration: Unlimited, dependent on Temp & cooling
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Ramp down rate: Temperature Dependent, max 150°C per second.
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Recommended steady state temperature range: RT - 1200°C
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Temperature accuracy: +1.78°C total errors
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Thermocouple temperature accuracy: +1.1°C
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Temperature repeatability: +2°C or better at Steady State
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Temperature uniformity: +2.5°C or better across a 6" (150 mm) wafer at 1150°C.
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For a titanium silicidation process, no more than 4% increase in non-uniformity
during the first anneal at 650°C to 700°C.
Applications
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The Solaris RTP system is a versatile tool that is useful for many applications:
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Ion Implant Activation
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Polysilicon Annealing
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Oxide Reflow
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Silicide Formation
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Contact Alloying
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Oxidation and Nitridation
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GaAs Processing
