top of page

SOLARIS 150mm UV

RAPID THERMAL PROCESS OVEN  (RTP)

Overview

The Solaris 150UV is a standalone unit or an added option for the
Solaris 150 RTP System.

Applications Include:

-Pre Gate Oxidation Cleaning

-Pre-Epi Cleaning

-Photoresist Descum

-Growth of Sacrificial Oxides

-Bond Pad Cleaning

-Cleaning of Critical Surfaces

-Hydrocarbon Removal

-High Temperature UV/Ozone Densification

Solaris 150mm Ultraviolet | Surface Science Integration
SOLARIS START
Solaris 150mm Ultraviolet | Surface Science Integration

Main Features

  • Wafer handling: Manual loading of wafer into the oven, single wafer processing

  • Wafer sizes: 2", 3", 4", 5", 6"

  • Ramp up rate: 1-150°C per second, user-controllable.

  • Recommended steady state duration: Unlimited, dependent on Temp & cooling

  • Ramp down rate: Temperature Dependent, max 150°C per second.

  • Recommended steady state temperature range: RT - 1200°C

  • Temperature accuracy: +1.78°C total errors

  • Thermocouple temperature accuracy: +1.1°C

  • Temperature repeatability: +2°C or better at Steady State

  • Temperature uniformity: +2.5°C or better across a 6" (150 mm) wafer at 1150°C.

  • For a titanium silicidation process, no more than 4% increase in non-uniformity

         during the first anneal at 650°C to 700°C.

Applications

  • The Solaris RTP system is a versatile tool that is useful for many applications:

  • Ion Implant Activation

  • Polysilicon Annealing

  • Oxide Reflow

  • Silicide Formation

  • Contact Alloying

  • Oxidation and Nitridation

  • GaAs Processing

Solaris 150mm Ultraviolet | Surface Science Integration
SOLARIS RUN SCREEN NO LMAPS ON NOW

Request a Quote 

bottom of page